Extreme Ultraviolet Lithography: Towards the Next Generation of Integrated Circuits
Optics & Photonics Focus
Volume 7 Story 4 - 4/11/2009

EUVL at work

Scanning electron microscope (SEM) image of a 22-nm half-pitch line-and-space pattern printed using EUVL.
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EUVL at work. Scanning electron microscope (SEM) image of a 22-nm half-pitch line-and-space pattern printed using EUVL.