Extreme Ultraviolet Lithography: Towards the Next Generation of Integrated Circuits
Optics & Photonics Focus
Volume 7 Story 4 - 4/11/2009

The Moore Law of lithography

The constant downsizing of the wavelength used in lithography and the increase in the numerical aperture (NA) have permitted the continuous reduction of the minimum integrated circuit feature size. The shift from 193 nm to 13.5 nm is the greatest jump the industry has experienced so far. Adapted with permission from "Extreme Ultraviolet Lithography," McGraw-Hill Professional, 2009.
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The Moore Law of lithography. The constant downsizing of the wavelength used in lithography and the increase in the numerical aperture (NA) have permitted the continuous reduction of the minimum integrated circuit feature size. The shift from 193 nm to 13.5 nm is the greatest jump the industry has experienced so far.